Many processes such as the fabrication of integrated circuits are carried out in a vacuum chamber to avoid reaction of the material with oxygen in the atmosphere. It is difficult to routinely lower the pressure in a vacuum chamber below 9.0 x10¹¹ Torr. Part B Correct What fraction of the gas phase molecules initially present for 1.0 atm in the chamber are present at 1.0 x 10-10 Torr? Express fraction to two significant figures.

Principles of Modern Chemistry
8th Edition
ISBN:9781305079113
Author:David W. Oxtoby, H. Pat Gillis, Laurie J. Butler
Publisher:David W. Oxtoby, H. Pat Gillis, Laurie J. Butler
Chapter9: The Gaseous State
Section: Chapter Questions
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Many processes such as the fabrication of
integrated circuits are carried out in a vacuum
chamber to avoid reaction of the material with
oxygen in the atmosphere. It is difficult to routinely
lower the pressure in a vacuum chamber below
9.0 x10¹¹ Torr.
Part B
Correct
What fraction of the gas phase molecules initially present for 1.0 atm in the chamber
are present at 1.0 x 10-10 Torr?
Express fraction to two significant figures.
Transcribed Image Text:Many processes such as the fabrication of integrated circuits are carried out in a vacuum chamber to avoid reaction of the material with oxygen in the atmosphere. It is difficult to routinely lower the pressure in a vacuum chamber below 9.0 x10¹¹ Torr. Part B Correct What fraction of the gas phase molecules initially present for 1.0 atm in the chamber are present at 1.0 x 10-10 Torr? Express fraction to two significant figures.
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