In photolithography, the mask is essential. Without the mask, photolithography can be finished. positive photoresist will stay on the substrate after UV exposure and subsequent development negative photoresist will be dissolved after UV exposure and subsequent development A 1000-level cleanroom is much better than a 10-level one chrome mask is better than a film mask
In photolithography, the mask is essential. Without the mask, photolithography can be finished. positive photoresist will stay on the substrate after UV exposure and subsequent development negative photoresist will be dissolved after UV exposure and subsequent development A 1000-level cleanroom is much better than a 10-level one chrome mask is better than a film mask
Elements Of Electromagnetics
7th Edition
ISBN:9780190698614
Author:Sadiku, Matthew N. O.
Publisher:Sadiku, Matthew N. O.
ChapterMA: Math Assessment
Section: Chapter Questions
Problem 1.1MA
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Which statement is right :
- In photolithography, the mask is essential. Without the mask, photolithography can be finished.
- positive photoresist will stay on the substrate after UV exposure and subsequent development
- negative photoresist will be dissolved after UV exposure and subsequent development
- A 1000-level cleanroom is much better than a 10-level one
- chrome mask is better than a film mask
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