The number of contaminating particles on a silicon wafer prior to a certain rinsing process was determfor each wafer in a sample size 100, resulting in the following frequencies:CumulativeCumulativeNumber of ParticlesFrequencyNumber of ParticlesFrequency88439.8826.10933181196429129754413996214100772a) What proportion of the sampled wafers had (P > 5) ?b) What proportion of the sampled wafers had between (4

Answered: II Cumulative Cumulative Number of…

Elements Of Electromagnetics

7th Edition

ISBN:9780190698614

Author:Sadiku, Matthew N. O.

Publisher:Sadiku, Matthew N. O.

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For a two degree of freedom system subject to free undamped vibrations, the inertia and stiffness coefficient matrices are given by: 67500] a) What type of coupling exits in this system? Briefly explain why. b) Calculate the natural frequencies of the system. c) Calcuate the ratio of amplitudes at each natural frequency. d) Calculate the orthonormalised eigenvectors and subsequently form the matrix of orthonormalised eigenvectors. [M] = [1000 25] and [k] = [4000 [40000 2.5 810.
ᴅᴀᴛᴀ ꜰᴏʀ ᴀ ꜱɪɴɢʟᴇ-ᴀᴄᴛɪɴɢ, ꜰᴏᴜʀ ꜱᴛʀᴏᴋᴇꜱ ᴅɪᴇꜱᴇʟ ᴇɴɢɪɴᴇ ᴜɴᴅᴇʀ ᴛᴇꜱᴛ ᴀʀᴇ ᴀꜱ ꜰᴏʟʟᴏᴡꜱ: 10.8 ᴋɢ/ʜʀ ᴏꜰ 24°ᴀᴘɪ ꜰᴜᴇʟ; ᴘʀᴏɴʏ ʙʀᴀᴋᴇ ᴛᴇꜱᴛ ᴅᴀᴛᴀ: ᴀʀᴍ, 107 ᴄᴍ; ɢʀᴏꜱꜱ ᴡᴛ. 127 ᴋɢ; ᴛᴀʀᴇ ᴡᴛ., 12 ᴋɢ; ꜱᴘᴇᴇᴅ, 420 ʀᴘᴍ; , 230 ᴍᴍ x 355 ᴍᴍ. ᴄᴀʟᴄᴜʟᴀᴛᴇ ᴀ) ʙʀᴀᴋᴇ ᴛʜᴇʀᴍᴀʟ ᴇꜰꜰɪᴄɪᴇɴᴄʏ, ʙ) ᴘɪꜱᴛᴏɴ ꜱᴘᴇᴇᴅ, ᴄ) ᴇɴɢɪɴᴇ ᴅɪꜱᴘʟᴀᴄᴇᴍᴇɴᴛ, ᴅ) ʙʀᴀᴋᴇ ꜱᴘ. ꜰᴜᴇʟ ᴄᴏɴꜱᴜᴍᴘᴛɪᴏɴ
Show which instrument has higher signal throughput: instrument a = focal length is 250mm and collimating mirror has a diameter of 2 inches; instrument b = focal length is 3 cm and collimating mirror has a diameter of 1 cm.
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II Cumulative Cumulative Number of Particles Frequency Number of Particles Frequency 8 84 3 88 10 93 3 18 11 96 29 12 13 97 5 44 99 6 62 14 100 7 72 a) What proportion of the sampled wafers had (P> 5)? b) What proportion of the sampled wafers had between (4< P < 8)?