Consider silicon at T300 k. A Hall Effect device is fabricated with the following parameters Oeometry (d-0.0S mm w-0.5 mm and L-5 mm); la 0.5 mA, V-1.25 V, and B-6.5x10 Teala, En16.5 mV/em, then the majority oarier mobility (em/V.S) is.

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Consider silicos at T300 k. A Hall Effeet device is fabricated with the following parameters
Oeometry (d-0.08 mm w-0.5 mm and L-5 mm); l 0.5 mA, V-1.25 V. and B-6.5x10
Tesla, En-16.5 mV/em, then the majority earrier mobility (em/V.S) in.
1020
2100
1200
1002 O
Transcribed Image Text:Consider silicos at T300 k. A Hall Effeet device is fabricated with the following parameters Oeometry (d-0.08 mm w-0.5 mm and L-5 mm); l 0.5 mA, V-1.25 V. and B-6.5x10 Tesla, En-16.5 mV/em, then the majority earrier mobility (em/V.S) in. 1020 2100 1200 1002 O
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