between p-type material with a doping level Na = 1 x 1015 cm³ and n-type material with a doping level of No = 1x 1016 cm³. Also calculate the height of the potential energy barrier that will prevent majority carriers from crossing over this barrier. Do the above calculations for three semiconductors: (i) Silicon (ii) Germanium (iii) Gallium Arsenic Answer: Semiconductor Vo (V) Eр (eV) Silicon 0.6375 Germanium 0.2633 GaAs 1.101

Introductory Circuit Analysis (13th Edition)
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ISBN:9780133923605
Author:Robert L. Boylestad
Publisher:Robert L. Boylestad
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Q1. Calculate the built in potential Vo that will be formed across the p-n junction (no bias)
between p-type material with a doping level NA = 1 x 1015 cm3 and n-type material with a
doping level of ND = 1x 1016 cm3. Also calculate the height of the potential energy barrier
that will prevent majority carriers from crossing over this barrier. Do the above calculations
for three semiconductors:
(i) Silicon
(ii) Germanium
(ii) Gallium Arsenic
Answer:
Semiconductor
Vo (V)
Ер (eV)
Silicon
0.6375
Germanium
0.2633
GaAs
1.101
Transcribed Image Text:Q1. Calculate the built in potential Vo that will be formed across the p-n junction (no bias) between p-type material with a doping level NA = 1 x 1015 cm3 and n-type material with a doping level of ND = 1x 1016 cm3. Also calculate the height of the potential energy barrier that will prevent majority carriers from crossing over this barrier. Do the above calculations for three semiconductors: (i) Silicon (ii) Germanium (ii) Gallium Arsenic Answer: Semiconductor Vo (V) Ер (eV) Silicon 0.6375 Germanium 0.2633 GaAs 1.101
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