At the end of its manufacturing process, a silicon wafer of diameter d = 258 mm , thickness ô =1 mm is at an initial temperature of 325 C and is allowed to cool in quiescent, ambient air and large surroundings for which T =T= 25 °C, What is the initial rate of cooling by convection (kJ/s) from the Lower surface ONLY (Watts)? 3 Silicon :p= 2330 kg/m , c = 813 J/kg K, k= 87.8 W/m·K" -6 Air: v = 32.15×10m /s, k = 0.0372 W/m K, a = 46.8 ×10 m /s, Pr = 0.686, %3D Quiescent air T Tsur Silicon wafer D, 8, e, T Select one:

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At the end of its manufacturing
process, a silicon wafer of diameter d=
258 mm , thickness & =1 mm is at an
initial temperature of 325 C and is
allowed to cool in quiescent, ambient
air and large surroundings for which
T =T= 25 C, What is the initial rate
of cooling by convection (kJ/s) from
the Lower surface ONLY (Watts)?
3
Silicon :p= 2330 kg/m , c̟
= 813
J/kg K, k = 87.8 W/m · K.
-6
Air: v
= 32.15×10 m /s, k = 0.0372
W/m· K, a = 46.8 ×10
0.686,
m /s, Pr =
Quiescent air
T
Tsur
Silicon wafer
D, 8, e, T
Select one:
Transcribed Image Text:At the end of its manufacturing process, a silicon wafer of diameter d= 258 mm , thickness & =1 mm is at an initial temperature of 325 C and is allowed to cool in quiescent, ambient air and large surroundings for which T =T= 25 C, What is the initial rate of cooling by convection (kJ/s) from the Lower surface ONLY (Watts)? 3 Silicon :p= 2330 kg/m , c̟ = 813 J/kg K, k = 87.8 W/m · K. -6 Air: v = 32.15×10 m /s, k = 0.0372 W/m· K, a = 46.8 ×10 0.686, m /s, Pr = Quiescent air T Tsur Silicon wafer D, 8, e, T Select one:
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