A silicon wafer is uniformly doped with 4.5 x 1016 phosphorus atoms/cm³ and 5.5 x 10¹6 boron atoms/cm³. Find the electron and hole concentra- tions, the electron and hole mobilities, and the re- sistivity of this silicon material at 300 K. Is this material n- or p-type?
A silicon wafer is uniformly doped with 4.5 x 1016 phosphorus atoms/cm³ and 5.5 x 10¹6 boron atoms/cm³. Find the electron and hole concentra- tions, the electron and hole mobilities, and the re- sistivity of this silicon material at 300 K. Is this material n- or p-type?
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Transcribed Image Text:### Semiconductor Doping Analysis
**Problem Statement:**
A silicon wafer is uniformly doped with:
- \( 4.5 \times 10^{16} \) phosphorus atoms/cm\(^3\)
- \( 5.5 \times 10^{16} \) boron atoms/cm\(^3\)
**Tasks:**
1. **Determine Electronic Properties:**
- Find the electron and hole concentrations.
- Calculate the electron and hole mobilities.
- Determine the resistivity of the silicon material at 300 K.
2. **Material Type:**
- Identify if the material is n-type or p-type.
**Solution Steps:**
- **Concentration Analysis:**
- Since both n-type (phosphorus) and p-type (boron) dopants are present, subtract their concentrations to find the dominant carrier type.
- Calculate the effective carrier concentration.
- **Mobility and Resistivity:**
- Use known values or equations for electron and hole mobility at 300 K.
- Use resistivity formulas based on carrier concentration and mobility.
- **Type Identification:**
- Compare dopant concentrations to determine whether n-type or p-type carriers dominate.
This analysis helps understand the electrical characteristics of the doped silicon wafer, crucial for semiconductor device applications.
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