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A new process has been developed for applying photoresist to 125-mm silicon wafers used in manufacturing integrated circuits. Ten wafers were tested, and the following photoresist thickness measurements (in angstroms × 1000) were observed: 13.3987, 13.3957, 13.3902, 13.4015, 13.4001, 13.3918, 13.3965, 13.3925, 13.3946, and 13.4002. (For your convenience, we have calculated sample mean: 13.4 and sample standard deviation: 0.0039. You can use them directly.) (a) Test the hypothesis that mean thickness is 13.4 × 1000 Å. Use a = 0.2 and assume a two- sided alternative. (b) Find a 90% two-sided confidence interval on mean photoresist thickness. Assume that thickness is normally distributed.

A new process has been developed for applying photoresist to 125-mm silicon wafers used in manufacturing integrated circuits. Ten wafers were tested, and the following photoresist thickness measurements (in angstroms × 1000) were observed: 13.3987, 13.3957, 13.3902, 13.4015, 13.4001, 13.3918, 13.3965, 13.3925, 13.3946, and 13.4002. (For your convenience, we have calculated sample mean: 13.4 and sample standard deviation: 0.0039. You can use them directly.) (a) Test the hypothesis that mean thickness is 13.4 × 1000 Å. Use a = 0.2 and assume a two- sided alternative. (b) Find a 90% two-sided confidence interval on mean photoresist thickness. Assume that thickness is normally distributed.

Glencoe Algebra 1, Student Edition, 9780079039897, 0079039898, 2018
Glencoe Algebra 1, Student Edition, 9780079039897, 0079039898, 2018
18th Edition
ISBN:9780079039897
Author:Carter
Publisher:Carter
Chapter10: Statistics
Section10.6: Summarizing Categorical Data
Problem 34PPS
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A new process has been developed for applying photoresist to 125-mm silicon wafers used in manufacturing integrated circuits. Ten wafers were tested, and the following photoresist thickness measurements (in angstroms × 1000) were observed: 13.3987, 13.3957, 13.3902, 13.4015, 13.4001, 13.3918, 13.3965, 13.3925, 13.3946, and 13.4002. (For your convenience, we have calculated sample mean: 13.4 and sample standard deviation: 0.0039. You can use them directly.) (a) Test the hypothesis that mean thickness is 13.4 × 1000 Å. Use a = 0.2 and assume a two- sided alternative. (b) Find a 90% two-sided confidence interval on mean photoresist thickness. Assume that thickness is normally distributed.
Transcribed Image Text:A new process has been developed for applying photoresist to 125-mm silicon wafers used in manufacturing integrated circuits. Ten wafers were tested, and the following photoresist thickness measurements (in angstroms × 1000) were observed: 13.3987, 13.3957, 13.3902, 13.4015, 13.4001, 13.3918, 13.3965, 13.3925, 13.3946, and 13.4002. (For your convenience, we have calculated sample mean: 13.4 and sample standard deviation: 0.0039. You can use them directly.) (a) Test the hypothesis that mean thickness is 13.4 × 1000 Å. Use a = 0.2 and assume a two- sided alternative. (b) Find a 90% two-sided confidence interval on mean photoresist thickness. Assume that thickness is normally distributed.
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