A 23 factorial design was used to develop a nitride each process on a single-wafer plasma etching tool Each factor is run at two levels, and the design is replicated twice. The response variable is the etch rate for silicon nitride. The etch rate data are shown below. Using the totals under the treatment combinations, determine the factor effect of AC. Answer in 3 decimal places. Coded Factors Etch Rate Replicate 1 Replicate 2 550 604 669 650 633 642 Run 1 2 3 4 5 6 7 8 5.625 A -1 1 -1 1 -1 1 -1 B C -1 -1 1 1 -1 -1 1 11 -1 -1 -1 -1 1 1 1 1 1037 749 1075 729 601 635 1052 868 1063 860 Total (1) = 1154 a = 1319 b=1234 ab= 1277 c = 2089 ac = 1617 bc= 2178 abc = 1589

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A 23 factorial design was used to develop a nitride each process on a single-wafer plasma etching tool Each factor is run at two levels, and the design is replicated
twice. The response variable is the etch rate for silicon nitride. The etch rate data are shown below. Using the totals under the treatment combinations, determine
the factor effect of AC. Answer in 3 decimal places.
Coded Factors
Etch Rate
Run
1
2
3
4
5
6
7
8
5.625
A
-1
1
-1
1
-1
1
-1
1
B
-1
-1
1
1
-1
-1
1
1
C
-1
-1
-1
-1
1
1
1
1
Replicate 1 Replicate 2
550
604
669
650
601
635
1052
633
642
1037
749
1075
729
868
1063
860
Total
(1) = 1154
1319
a
b= 1234
ab = 1277
c = 2089
ac = 1617
bc= 2178
abc = 1589
=
Transcribed Image Text:A 23 factorial design was used to develop a nitride each process on a single-wafer plasma etching tool Each factor is run at two levels, and the design is replicated twice. The response variable is the etch rate for silicon nitride. The etch rate data are shown below. Using the totals under the treatment combinations, determine the factor effect of AC. Answer in 3 decimal places. Coded Factors Etch Rate Run 1 2 3 4 5 6 7 8 5.625 A -1 1 -1 1 -1 1 -1 1 B -1 -1 1 1 -1 -1 1 1 C -1 -1 -1 -1 1 1 1 1 Replicate 1 Replicate 2 550 604 669 650 601 635 1052 633 642 1037 749 1075 729 868 1063 860 Total (1) = 1154 1319 a b= 1234 ab = 1277 c = 2089 ac = 1617 bc= 2178 abc = 1589 =
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