A 23 factorial design was used to develop a nitride each process on a single-wafer plasma etching tool Each factor is run at two levels, and the design is replicated twice. The response variable is the etch rate for silicon nitride. The etch rate data are shown below. Using the totals under the treatment combinations, determine the factor effect of AC. Answer in 3 decimal places. Coded Factors Etch Rate Replicate 1 Replicate 2 550 604 669 650 633 642 Run 1 2 3 4 5 6 7 8 5.625 A -1 1 -1 1 -1 1 -1 B C -1 -1 1 1 -1 -1 1 11 -1 -1 -1 -1 1 1 1 1 1037 749 1075 729 601 635 1052 868 1063 860 Total (1) = 1154 a = 1319 b=1234 ab= 1277 c = 2089 ac = 1617 bc= 2178 abc = 1589
A 23 factorial design was used to develop a nitride each process on a single-wafer plasma etching tool Each factor is run at two levels, and the design is replicated twice. The response variable is the etch rate for silicon nitride. The etch rate data are shown below. Using the totals under the treatment combinations, determine the factor effect of AC. Answer in 3 decimal places. Coded Factors Etch Rate Replicate 1 Replicate 2 550 604 669 650 633 642 Run 1 2 3 4 5 6 7 8 5.625 A -1 1 -1 1 -1 1 -1 B C -1 -1 1 1 -1 -1 1 11 -1 -1 -1 -1 1 1 1 1 1037 749 1075 729 601 635 1052 868 1063 860 Total (1) = 1154 a = 1319 b=1234 ab= 1277 c = 2089 ac = 1617 bc= 2178 abc = 1589
Holt Mcdougal Larson Pre-algebra: Student Edition 2012
1st Edition
ISBN:9780547587776
Author:HOLT MCDOUGAL
Publisher:HOLT MCDOUGAL
Chapter1: Variables, Expressions, And Integers
Section1.5: Adding Integers
Problem 45E
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