6E.23 cise 6.65 de Oxide ness Wafer Thickness 16 58.4 17 51.0 18 41.2 19 47.1 20 45.7
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Transcribed Image Text:- TABLE 6E.23
Data. for Exercise 6.65
Oxide
Oxide
Wafer Thickness Wafer Thickness
45.4
16
58.4
2
48.6
17
51.0
3
49.5
18
41.2
4
44.0
19
47.1
5
50.9
20
45.7
55.2
21
60.6
45.5
22
51.0
52.8
23
53.0
45.3
24
56.0
10
46.3
25
47.2
11
53.9
26
48.0
12
49.8
27
55.9
13
46.9
28
50.0
14
49.8
29
47.9
15
45.1
30
53.4
Plot these observations against the control limits
determined in part (a). Is the process in control?
(c) Suppose the assignable cause responsible for the
out-of-control signal in part (b) is discovered and
removed from the process. Twenty additional
wafers are subsequently sampled. Plot the oxide
thickness against the part (a) control limits. What
conclusions can you draw? The new data are
shown in Table 6E.25.
6700
Transcribed Image Text:6.65. (a) Thirty observations on the oxide thickness of
individual silicon wafers are shown in Table
6E.23. Use these data to set up a control chart on
oxide thickness and a moving range chart. Does
the process exhibit statistical control? Does oxide
thickness follow a normal distribution?
(b) Following the establishment of the control charts
in part (a), 10 new wafers were observed. The
oxide thickness measurements are as follows:
Oxide
Oxide
Wafer
Thickness
Wafer
Thickness
1
54.3
6.
51.5
2
57.5
7
58.4
3
64.8
8
67.5
4
62.1
61.1
5
59.6
10
63.3
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