2-61. Consider the data on wafer contamination and loca- tion in the sputtering tool shown in Table 2-2. Assume that one wafer is selected at random from this set. Let A denote the event that a wafer contains four or more particles, and let B denote the event that a wafer is from the center of the sputter- ing tool. Determine: (а) Р(А) (с) Р(В) (e) P(A N B) (b) Р(А|В) (d) Р(B|4) (f) P(A U B)
2-61. Consider the data on wafer contamination and loca- tion in the sputtering tool shown in Table 2-2. Assume that one wafer is selected at random from this set. Let A denote the event that a wafer contains four or more particles, and let B denote the event that a wafer is from the center of the sputter- ing tool. Determine: (а) Р(А) (с) Р(В) (e) P(A N B) (b) Р(А|В) (d) Р(B|4) (f) P(A U B)
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Transcribed Image Text:2-61. Consider the data on wafer contamination and loca-
tion in the sputtering tool shown in Table 2-2. Assume that one
wafer is selected at random from this set. Let A denote the
event that a wafer contains four or more particles, and let B
denote the event that a wafer is from the center of the sputter-
ing tool. Determine:
(a) P(A)
(c) P(B)
(e) P(A N B) (f) P(AU B)
() Р(А|В)
(d) P(B|A)

Transcribed Image Text:Table 2-2 Wafers Classified by Contamination and Location
Number of
Contamination
Particles
Center
Edge
Totals
0.30
0.10
0.40
1
0.15
0.05
0.20
0.10
0.05
0.15
3
0.06
0.04
0.10
4
0.04
0.01
0.05
5 or more
0.07
0.03
0.10
Totals
0.72
0.28
1.00
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