1. Intel uses a solution of potassium hydroxide to etch silicon wafers for manufacturing processors.They purchase a solution of 33% (m/m) KOH that has a density of 1.21 g/mL. This is called Developer Solution.However, for certain applications, developer solution is too concentrated. For these special applications, 25 L of Developer Solution is diluted up to a final volume of 100. L. This is called Diluted Developer Solution. Part 1: Calculate the molar concentration of the KOH Developer Solution? Part 2: Calculate the molar concentration of the Diluted KOH Developer Solution? Part 3: An out of control robot spills an unknown amount of the regular KOH Developer solution. Does the remaining solution still have the same concentration? Why or why not?
1. Intel uses a solution of potassium hydroxide to etch silicon wafers for manufacturing processors.They purchase a solution of 33% (m/m) KOH that has a density of 1.21 g/mL. This is called Developer Solution.However, for certain applications, developer solution is too concentrated. For these special applications, 25 L of Developer Solution is diluted up to a final volume of 100. L. This is called Diluted Developer Solution.
Part 1: Calculate the molar concentration of the KOH Developer Solution?
Part 2: Calculate the molar concentration of the Diluted KOH Developer Solution?
Part 3: An out of control robot spills an unknown amount of the regular KOH Developer solution. Does the remaining solution still have the same concentration? Why or why not?
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