1. Intel uses a solution of potassium hydroxide to etch silicon wafers for manufacturing processors.They purchase a solution of 33% (m/m) KOH that has a density of 1.21 g/mL. This is called Developer Solution.However, for certain applications, developer solution is too concentrated. For these special applications, 25 L of Developer Solution is diluted up to a final volume of 100. L. This is called Diluted Developer Solution. Part 1: Calculate the molar concentration of the KOH Developer Solution? Part 2: Calculate the molar concentration of the Diluted KOH Developer Solution? Part 3: An out of control robot spills an unknown amount of the regular KOH Developer solution. Does the remaining solution still have the same concentration? Why or why not?

Chemistry
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ISBN:9781305957404
Author:Steven S. Zumdahl, Susan A. Zumdahl, Donald J. DeCoste
Publisher:Steven S. Zumdahl, Susan A. Zumdahl, Donald J. DeCoste
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1. Intel uses a solution of potassium hydroxide to etch silicon wafers for manufacturing processors.They purchase a solution of 33% (m/m) KOH that has a density of 1.21 g/mL. This is called Developer Solution.However, for certain applications, developer solution is too concentrated. For these special applications, 25 L of Developer Solution is diluted up to a final volume of 100. L. This is called Diluted Developer Solution.

Part 1: Calculate the molar concentration of the KOH Developer Solution?

Part 2: Calculate the molar concentration of the Diluted KOH Developer Solution?

Part 3: An out of control robot spills an unknown amount of the regular KOH Developer solution. Does the remaining solution still have the same concentration? Why or why not?

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