1. (a) Consider a process technology for which tax = 8 µm, µn = 450 cm?/Vs and V = 0.7 V. i. Determine Cox and K'n ii. For a MOSFET operating in saturation region with ID = 100 µA and W/L= 8 µum /0.6 um, calculate the values of Vow, VGs and Vosmin- (Give explanation about your Vosmin Vvalue). (b) With proper diagram briefly describe what is Channel-Length Modulation.

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1. (a) Consider a process technology for which tex = 8 µm, µn = 450 cm?/Vs and V = 0.7 V.
i.
Determine Cox and K'n:
ii.
For a MOSFET operating in saturation region with ID = 100 µA and W/L= 8 µum /0.6 um, calculate the
values of Vow, Vas and Vosmin- (Give explanation about your Vosmin value).
(b) With proper diagram briefly describe what is Channel-Length Modulation.
Transcribed Image Text:1. (a) Consider a process technology for which tex = 8 µm, µn = 450 cm?/Vs and V = 0.7 V. i. Determine Cox and K'n: ii. For a MOSFET operating in saturation region with ID = 100 µA and W/L= 8 µum /0.6 um, calculate the values of Vow, Vas and Vosmin- (Give explanation about your Vosmin value). (b) With proper diagram briefly describe what is Channel-Length Modulation.
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