Chapter 4, Problem 28P

1. What are the key steps involved in the fabrication of a semiconductor device. 2. You are hired by a chip manufacturing company, and you are asked to prepare a silicon wafer with the pattern below. Describe the process you would use. High Aspect Ratio Trenches Undoped Si Wafer P-doped Si 3. You would like to deposit material within a high aspect ratio trench. What approach would you use and why? 4. A person is setting up a small clean room space to carry out an outreach activity to educate high school students about patterning using photolithography. They obtained a positive photoresist, a used spin coater, a high energy light lamp for exposure and ordered a plastic transparency mask with a pattern on it to reduce cost. Upon trying this set up multiple times they find that the full resist gets developed, and they are unable to transfer the pattern onto the resist. Help them troubleshoot and find out why pattern of transfer has not been successful. 5. You are given a composite…

Two complex values are  z1=8 + 8i,  z2=15 + 7 i.  z1∗  and  z2∗ are the complex conjugate values. Any complex value can be expessed in the form of a+bi=reiθ. Find r and θ for (z1-z∗2)/z1+z2∗. Find r and θ for (z1−z2∗)z1z2∗   Please show all steps

An electromagnetic wave is traveling through vacuum in the positive x direction. Its electric field vector is given by E=E0sin⁡(kx−ωt)j^,where j^ is the unit vector in the y direction. If B0 is the amplitude of the magnetic field vector, find the complete expression for the magnetic field vector B→ of the wave.  What is the Poynting vector S(x,t), that is, the power per unit area associated with the electromagnetic wave described in the problem introduction? Give your answer in terms of some or all of the variables E0, B0, k, x, ω, t, and μ0. Specify the direction of the Poynting vector using the unit vectors i^, j^, and k^ as appropriate. Please explain all steps

Another worker is performing a task with an RWL of only 9 kg and is lifting 18 kg, giving him an LI of 2.0 (high risk). Questions:What is the primary issue according to NIOSH?Name two factors of the RWL that could be improved to reduce risk.If the horizontal distance is reduced from 50 cm to 30 cm, how does the HM change and what effect would it have?

Two complex values are  z1=8 + 8i,  z2=15 + 7 i.  z1∗ and z2∗ are the complex conjugate values. Any complex value can be expessed in the form of a+bi=reiθ. Find r and θ for  z1z2∗. Find r and θ for z1/z2∗? Find r and θ for (z1−z2)∗/z1+z2∗. Find r and θ for (z1−z2)∗/z1z2∗ Please explain all steps, Thank you

An ac series circuit consists of a voltage source of frequency 60 Hz and voltage amplitude V, a 505-Ω resistor, and a capacitor of capacitance 7.2 μF. What must be the source voltage amplitude V for the average electrical power consumed in the resistor to be 236 W? There is no inductance in the circuit.

An L−R−C series circuit has R= 280 Ω . At the frequency of the source, the inductor has reactance XLL= 905 Ω and the capacitor has reactance XC= 485 Ω . The amplitude of the voltage across the inductor is 445 V . What is the amplitude of the voltage across the resistor and the capacitor? What is the voltage amplitude of the source? What is the rate at which the source is delivering electrical energy to the circuit?

A 0.185 H inductor is connected in series with a 98.5 Ω resistor and an ac source. The voltage across the inductor is vL=−(12.5V)sin[(476rad/s)t]vL.  Derive an expression for the voltage vR across the resistor. Express your answer in terms of the variables L, R, VL (amplitude of the voltage across the inductor), ω, and t. What is vR at 2.13 ms ? Please explain all steps

A worker lifts a box under the following conditions:Horizontal distance (H): 30 cmInitial height (V): 60 cmVertical travel (D): 50 cmTorso rotation (A): 30°Frequency: 3 times/minute for 1 hourGrip: Good Question:What is the RWL for this task?What does this value mean in terms of occupational safety?