What is the percent by weight of silicon dioxide in a 1.0006g sample decomposed with hydrochloric acid which will leave a 0.2828g residue. After the treatment using HF and sulfuric acid then evaporating with silicon tetrafluoride, 0.0366g residue remains. For the said procedure the mass of silicon dioxide is the mass difference before and after volatizing with silicon tetrafluoride. O24.16% O 24.61% O 42.16% O 42.61%

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What is the percent by weight of silicon dioxide in a 1.0006g sample
decomposed with hydrochloric acid which will leave a 0.2828g residue. After
the treatment using HF and sulfuric acid then evaporating with silicon
tetrafluoride, 0.0366g residue remains. For the said procedure the mass of
silicon dioxide is the mass difference before and after volatizing with silicon
tetrafluoride.
O 24.16%
O 24.61%
42.16%
O 42.61%
Transcribed Image Text:What is the percent by weight of silicon dioxide in a 1.0006g sample decomposed with hydrochloric acid which will leave a 0.2828g residue. After the treatment using HF and sulfuric acid then evaporating with silicon tetrafluoride, 0.0366g residue remains. For the said procedure the mass of silicon dioxide is the mass difference before and after volatizing with silicon tetrafluoride. O 24.16% O 24.61% 42.16% O 42.61%
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