A silicon sample is doped with phosphorus impurity concentration of 10 cm*. At 300K, calculate the electron and hole concentrations and position of the Fermi level. Assume that the distribution of states in the conduction band is given by N(E) dE = 8x1020 VEDE cm³ where E is the energy expressed in electron volts. %3D Calculate the number of electrons between the energy interval 1.9kT and 2.1kT above the band edge of the conduction band Ec.

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A silicon sample is doped with phosphorus impurity concentration of 10 cm
At 300K, calculate the electron and hole concentrations and position of the Fermi
level. Assume that the distribution of states in the conduction band is given by
N(E) dE = 8x1020 VEDE cm where E is the energy expressed in electron volts.
Calculate the number of electrons between the energy interval 1.9kT and 2.1kT
above the band edge of the conduction band Ec.
Transcribed Image Text:15 -3 A silicon sample is doped with phosphorus impurity concentration of 10 cm At 300K, calculate the electron and hole concentrations and position of the Fermi level. Assume that the distribution of states in the conduction band is given by N(E) dE = 8x1020 VEDE cm where E is the energy expressed in electron volts. Calculate the number of electrons between the energy interval 1.9kT and 2.1kT above the band edge of the conduction band Ec.
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